CANON acquired ANELVA and became CANON ANELVA Corporation which focuses on: Vacuum thin-film deposition and processing equipment, semiconductor device manufacturing equipment, storage device manufacturing equipment, equipment for electronic device manufacturing and for R&D, maintenance service, and vacuum components.


CANON / ANELVA

C 7100GT

ILC 1051

C-7500L

ILC 1080

COSMOS I-1201

I-1060 SVII

SPC-530H	

L-430S-FHL

C-7730FH

FC7100

SPF-312

L-430S-FH

SPL-500

C-7960FL

SPF-313H

COSMOS I-1281

ILC-1012

ILC-1013

L-332S-FH

IC7200

System configuration: Tray cluster PVD equipment
Substrate size: φ2" substrate to φ8" substrate

EC8100

COSMOS 300 I-1201

C-7010C

System configuration: Cluster type
Substrate: Φ300 mm

NC7900

SPF-430H

System configuration: Cluster type (up to three process chambers) C to C type
Substrate size: φ200mm maximum
Cathode: φ7.1" cathode (Up to 4. Varies depending on the module.)

Modules:
Offset rotary sputtering module (multi-cathode specification)
Offset rotary and revolutionary sputtering module
Etching module (preprocessing)
Preheating module (preprocessing)

EC7400

The Anelva I-1060 SVII PLUS-1 is a sputter coating equipment that provides users with precise metal film deposition capabilities. This sputtering system is used to physically vaporize metal pellets, which can then be deposited onto a substrate through reactive ionization equipment

I-1060 SVII PLUS-1

System configuration: Tray transport method (Load lock is option)
Substrate size: φ150mm maximum (Have it of load lock;greatest φ100mm)
Cathode: φ2" cathode ×3
Operation method: Auto pumping operation, manual transport/deposit operation
Footprint: W1800mm×D1100mm×H1550mm (standard specification)

EB1000

System configuration: Cluster type (up to three annealing chambers) C to C type
Substrate size: φ3", φ4", φ6"

EC7200

System configuration: Load lock type tray transport method
Substrate size: φ200mm maximum
Cathode: φ4" cathode ×3 (Option: φ12.5" cathode ×1, φ4" cathode ×4)
Operation method: Fully automated (pumping, transport, deposition)

EB1100

System configuration: Cluster-type (EC7000 sputtering chamber ×1, EC7001 sputtering chamber ×2) Tray transport method
Substrate size: φ200mm maximum
Cathode: φ4" cathode ×3 (Option: φ12.5" cathode ×1, φ4" cathode ×4)
Operation method: Fully automated (pumping, transport, deposition)

EC7001

ILC 1000

Effectively consolidates magnetic head production processes.This is an integrated magnetic HEAD production equipment only possible with Canon ANELVA product lineup.

System configuration: Cluster type
Substrate size: φ150mm, φ200mm

HC7300

ML3000

HC7100 is a sputtering equipment for GMR heads and TMR heads that utilizes the tunnel effect.
System configuration: Cluster type
Substrate size: φ150mm、φ200mm

HC7100

Upgrade from HC7100 (PVD equipment for head) enabling mass-production of φ300 mm wafers based on experience with the φ300 mm wafer production line.

EC7800

I-1230

EC3000

The Anelva ILC-1015 is a sputtering system manufactured by Canon/Anelva. It is used for semiconductor processing assembly

ILC-1015

IC7400

EL3000

C 7100

C-7300EX

The Anelva I-1060 SV is a sputtering system that can handle 8" wafers with a notch. It has a Chamber L1 with an Etch (TMP) structure, a 110 Holder Mg, and uses Ar gas. The power supply for this chamber is 60M + 400 KHz, 1kW (RF).

I-1060 SV

EC7000

System configuration: Vertical Inline configuration

Applicable process module for one side will be as follows
• Anneal module
• Sputtering module

Substrate:
□650mm
□300mm
φ300mm

EL3400

I-1060

C-7010

FC7102

EVC-1701

Electronic component production
System configuration: Horizontal inline type
Substrate size: Effective deposition area 300mm×450mm
Cathode: 5"×16" cathode×3 (single side)

EL3200

I-1100 C 

IC7500

The Anelva ILC-1060 is a specific model of a magnetron sputtering system. It features  features a vacuum chamber that provides a controlled environment for thin film deposition. The ILC-1060 can accommodate a variety of target materials, such as metals, alloys, or compounds, depending on the specific application requirements

CANON / ANELVA

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Top CANON / ANELVA PVD / Sputtering

ILC 1051

C 7100GT

C-7500L

I-1060 SVII

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