
Description
AMAT ENDURA2 CH2 - ALD TiN, CH3 - ALD TiN,CH5 - ALD TiN (3x Chamber breakout)Configuration
x3 ChambersOEM Model Description
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.Documents
No documents
CATEGORY
PVD / Sputtering
Last Verified: 15 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
136521
Wafer Sizes:
12"/300mm
Vintage:
2014
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View AllAPPLIED MATERIALS (AMAT)
ENDURA II
CATEGORY
PVD / Sputtering
Last Verified: 15 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
136521
Wafer Sizes:
12"/300mm
Vintage:
2014
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
AMAT ENDURA2 CH2 - ALD TiN, CH3 - ALD TiN,CH5 - ALD TiN (3x Chamber breakout)Configuration
x3 ChambersOEM Model Description
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.Documents
No documents