We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. Read More
ATC-H-2020
Category
PVD / SputteringOverview
For coating substrates up to 300mm in diameter, this system accommodates up to (4) 4” sputtering sources simultaneously using (2) sources at different angles to uniformly coat 300mm Ø area. This tool also includes a broad beam End Hall ion source for substrate pre-clean and sample preparation.
Active Listings
0
Services
Inspection, Insurance, Appraisal, Logistics
Top Listings
- No products found