Description

Light Etch

Configuration

EFEM, 2x twin PM, AC rack, UPS, TM

OEM Model Description

paradigmE XP series products have excellent etch selectivity and low plasma damage for on-wafer devices, and are widely used for film etching in semiconductor front-end and back-end manufacturing.

Documents

No documents

MATTSON

paradigmE XP

Verified

Plasma Etch

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

95265

Wafer Sizes:

12"/300mm

Vintage:

2010

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Logistics Support

Available

Money Back Guarantee

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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MATTSON

paradigmE XP

Plasma Etch

Vintage: 2010Condition: Used

Last VerifiedOver 60 days ago

MATTSON

paradigmE XP

Verified

Plasma Etch

Last Verified: Over 60 days ago

listing-photo-a6f05698e7894a658b566b64df09bc48-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

95265

Wafer Sizes:

12"/300mm

Vintage:

2010

Logistics Support

Available

Money Back Guarantee

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

Description

Light Etch

Configuration

EFEM, 2x twin PM, AC rack, UPS, TM

OEM Model Description

paradigmE XP series products have excellent etch selectivity and low plasma damage for on-wafer devices, and are widely used for film etching in semiconductor front-end and back-end manufacturing.

Documents

No documents

Similar Listings

View All

MATTSON

paradigmE XP

Plasma EtchVintage: 2010Condition: UsedLast Verified: Over 60 days ago