ASPEN III
Category
Dry / Plasma EtchOverview
The Aspen III’s exceptional platform design can handle both 200 mm and 300 mm wafers, and supports special wafer handling including warped and translucent wafers. The unique process chamber architecture can accommodate technical requirements across multiple technology nodes for the most demanding device manufacturers in the industry.
Active Listings
23
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MATTSON
ASPEN III
Dry / Plasma EtchVintage: 2006Condition: RefurbishedLast VerifiedOver 30 days agoMATTSON
ASPEN III
Dry / Plasma EtchVintage: Condition: Parts ToolLast VerifiedOver 60 days agoMATTSON
ASPEN III
Dry / Plasma EtchVintage: Condition: UsedLast VerifiedOver 60 days agoMATTSON
ASPEN III
Dry / Plasma EtchVintage: Condition: UsedLast Verified9 days ago
MATTSON
ASPEN III
Dry / Plasma EtchVintage: Condition: UsedLast Verified9 days agoMATTSON
ASPEN III
Dry / Plasma EtchVintage: Condition: UsedLast Verified9 days agoMATTSON
ASPEN III
Dry / Plasma EtchVintage: Condition: UsedLast Verified20 days agoMATTSON
ASPEN III
Dry / Plasma EtchVintage: Condition: UsedLast Verified20 days ago