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APPLIED MATERIALS (AMAT) CENTURA IPS
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The AMAT / APPLIED MATERIALS Centura IPS (induced plasma source) is a dialectric etch system. This AMAT Centura is configured with Inductively Coupled Parallel Plate Semiconductor Dielectric Etch (IPS) chamber. The IPS chamber can be used alone or with other chambers on the Centura platform. The AMAT / APPLIED MATERIALS Centura IPS can be configured for wafer sizes up to 300mm. Applications for the AMAT / APPLIED MATERIALS Centura IPS include etching dual damascene structures in copper-based devices.
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    APPLIED MATERIALS (AMAT)

    CENTURA IPS

    verified-listing-icon

    Verified

    CATEGORY

    Plasma Etch
    Last Verified: Over 60 days ago
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    63390

    Wafer Sizes:

    Unknown

    Vintage:

    2000

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    APPLIED MATERIALS (AMAT) CENTURA IPS
    APPLIED MATERIALS (AMAT)CENTURA IPSPlasma Etch
    Vintage: 2000Condition: Used
    Last VerifiedOver 60 days ago

    APPLIED MATERIALS (AMAT)

    CENTURA IPS

    verified-listing-icon

    Verified

    CATEGORY

    Plasma Etch
    Last Verified: Over 60 days ago
    listing-photo-e5b2417e64f14017ae06a0e890b27a10-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    63390

    Wafer Sizes:

    Unknown

    Vintage:

    2000

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The AMAT / APPLIED MATERIALS Centura IPS (induced plasma source) is a dialectric etch system. This AMAT Centura is configured with Inductively Coupled Parallel Plate Semiconductor Dielectric Etch (IPS) chamber. The IPS chamber can be used alone or with other chambers on the Centura platform. The AMAT / APPLIED MATERIALS Centura IPS can be configured for wafer sizes up to 300mm. Applications for the AMAT / APPLIED MATERIALS Centura IPS include etching dual damascene structures in copper-based devices.
    Documents

    No documents

    Similar Listings
    View All
    APPLIED MATERIALS (AMAT) CENTURA IPS
    APPLIED MATERIALS (AMAT)
    CENTURA IPS
    Plasma EtchVintage: 2000Condition: UsedLast Verified: Over 60 days ago