FX-22S
Category
PhotolithographyOverview
Resolution: ≦ 2.4 µm (isolated pattern), ≦ 3 µm (L/S) Projection magnification: 1:1 Exposure field: 400 × 714 mm Overlay: ≦ 0.6 µm (3σ) Maximum plate size: 920 × 920 mm
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