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TEL / TOKYO ELECTRON TRIASe+ SFD TiN
  • TEL / TOKYO ELECTRON TRIASe+ SFD TiN
  • TEL / TOKYO ELECTRON TRIASe+ SFD TiN
  • TEL / TOKYO ELECTRON TRIASe+ SFD TiN
Description
12-inch titanium/titanium nitride chemical vapor deposition machine
Configuration
TEL/ Trias SFD-TiN & SFD-HP Ti
OEM Model Description
Triase+™ SFD™ TiN has been widely adopted by using SFD™ technology that has both merits of excellent step coverage of ALD and high productivity of CVD.
Documents
CATEGORY
PECVD

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

92174


Wafer Sizes:

12"/300mm


Vintage:

2010


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

TEL / TOKYO ELECTRON

TRIASe+ SFD TiN

verified-listing-icon
Verified
CATEGORY
PECVD
Last Verified: Over 60 days ago
listing-photo-2731498c51254451aaf9684cbb49817c-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1692/92174/af23fb43614848f3ad9f39fadd1d7e6f_f4d946155c674a53916657b8a461df00picture112262023_mw.png
listing-photo-2731498c51254451aaf9684cbb49817c-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1692/92174/37f3a1f33be246429a985254c56a00ab_83986963a9274449a25fe2b3b346edfcpicture12262023_mw.png
listing-photo-2731498c51254451aaf9684cbb49817c-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1692/92174/2f88912b8f2c41f8b8e409c3802cac77_9e27adecefe34513a791531df484773epicture212262023_mw.png
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

92174


Wafer Sizes:

12"/300mm


Vintage:

2010


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
12-inch titanium/titanium nitride chemical vapor deposition machine
Configuration
TEL/ Trias SFD-TiN & SFD-HP Ti
OEM Model Description
Triase+™ SFD™ TiN has been widely adopted by using SFD™ technology that has both merits of excellent step coverage of ALD and high productivity of CVD.
Documents