Description

Plasmalab 100+RIE System 208V, 50/60Hz, w/ VAT PM-5 adaptive pressure controller, 2ea Adixen ACT 600M turbopump controller. Leybold D65BCS vacuum pump w/ oil filter & exhaust filter; BOC Edwards XDS10 scroll vacuum pump; Thermo Neslab RTE 740 chiller, BOM# 274103200000; gas box; control computer (no HDD) & LCD monitor. 64in x 29in x 49in H.

Configuration

No Configuration

OEM Model Description

The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces

Documents

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OXFORD

PLASMALAB 100

Verified

PECVD

Last Verified: Over 30 days ago

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

135812

Wafer Sizes:

8"/200mm

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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