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APPLIED MATERIALS (AMAT) CENTURA 5200 DXZ
    Description
    No description
    Configuration
    3 DxZ Chambers w/ RPS
    OEM Model Description
    The Centura 5200 DXZ is used for advanced 150mm and 200mm CVD technology in the advanced CMOS and MtM segments. It can be used for ultra-thick oxides (≥20µm), low-temperature processing (<200°C), conformal, low wet-etch-rate films, and doped films with tunable refractive indices. The system can handle a variety of MtM substrates (including SiC wafers) reliably and carefully from load lock wafer mapping to clear wafer orientation to wafer placement.
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    APPLIED MATERIALS (AMAT)

    CENTURA 5200 DXZ

    verified-listing-icon

    Verified

    CATEGORY
    PECVD

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    15128


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown

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    APPLIED MATERIALS (AMAT) CENTURA 5200 DXZ

    APPLIED MATERIALS (AMAT)

    CENTURA 5200 DXZ

    PECVD
    Vintage: 0Condition: Parts Tool
    Last VerifiedOver 60 days ago

    APPLIED MATERIALS (AMAT)

    CENTURA 5200 DXZ

    verified-listing-icon
    Verified
    CATEGORY
    PECVD
    Last Verified: Over 60 days ago
    listing-photo-C5CU38jO5wPozNn99-LWlUkMLFwhi3yZJdPArlwWR-Y-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    15128


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    3 DxZ Chambers w/ RPS
    OEM Model Description
    The Centura 5200 DXZ is used for advanced 150mm and 200mm CVD technology in the advanced CMOS and MtM segments. It can be used for ultra-thick oxides (≥20µm), low-temperature processing (<200°C), conformal, low wet-etch-rate films, and doped films with tunable refractive indices. The system can handle a variety of MtM substrates (including SiC wafers) reliably and carefully from load lock wafer mapping to clear wafer orientation to wafer placement.
    Documents

    No documents

    Similar Listings
    View All
    APPLIED MATERIALS (AMAT) CENTURA 5200 DXZ

    APPLIED MATERIALS (AMAT)

    CENTURA 5200 DXZ

    PECVDVintage: 0Condition: Parts ToolLast Verified: Over 60 days ago
    APPLIED MATERIALS (AMAT) CENTURA 5200 DXZ

    APPLIED MATERIALS (AMAT)

    CENTURA 5200 DXZ

    PECVDVintage: 0Condition: UsedLast Verified: Over 60 days ago