Description
APPLIED MATERIALS AKT 15 K GEN 5 PECVD CHAMBER ONLY. These chambers were never commissioned and remain in “new” unused condtion. Chambers being sold “AS IS”Configuration
Substrate Size: 1200 mm x 1300 mm MKS ASTeX Remote Plasma Source, Model: ASTRON e/exOEM Model Description
AKT-15K PECVD(1,200mm x 1,300mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafersDocuments
No documents
APPLIED MATERIALS (AMAT) / APPLIED KOMATSU TECH (AKT)
15K PECVD
Verified
CATEGORY
PECVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Parts Tool
Operational Status:
Unknown
Product ID:
113547
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / APPLIED KOMATSU TECH (AKT)
15K PECVD
CATEGORY
PECVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Parts Tool
Operational Status:
Unknown
Product ID:
113547
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
APPLIED MATERIALS AKT 15 K GEN 5 PECVD CHAMBER ONLY. These chambers were never commissioned and remain in “new” unused condtion. Chambers being sold “AS IS”Configuration
Substrate Size: 1200 mm x 1300 mm MKS ASTeX Remote Plasma Source, Model: ASTRON e/exOEM Model Description
AKT-15K PECVD(1,200mm x 1,300mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafersDocuments
No documents