Description
Single Wafer Rapid Thermal FurnaceConfiguration
No ConfigurationOEM Model Description
The SAO-200LP system is designed based on a resistively heated, stacked process module technology to address ambient controlled, low temperature annealing applications up to 450°C. The system processes five wafers simultaneously and provides excellent process repeatability and stability at a minimum cost of ownership.Documents
No documents
CATEGORY
Oven
Last Verified: 16 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
143391
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON / WAFERMASTERS
SAO-200LP
CATEGORY
Oven
Last Verified: 16 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
143391
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Single Wafer Rapid Thermal FurnaceConfiguration
No ConfigurationOEM Model Description
The SAO-200LP system is designed based on a resistively heated, stacked process module technology to address ambient controlled, low temperature annealing applications up to 450°C. The system processes five wafers simultaneously and provides excellent process repeatability and stability at a minimum cost of ownership.Documents
No documents