Description

Propel 300mm Process Module - Reactor Cart Assembly 300mm GaN - 300mm stainless steel high efficiency water cooled growth chamber - Temperature controlled Uniform Flow Flange assembly with temperature and flow monitoring - Integrated rotation mechanism, motor, and drive assembly - Reactor temperature management system with temperature and water level alarms - Three zone resistive heater assembly with heat shields, electrical connectors and insulators Electronics Control Module 3 Zone DC Power Supplies for Heater Power - Digital devices industry-standard DeviceNet digital network - Standardized cables and interconnects - Capable of facilities UPS (customer supplied) - H2 Detector Included - Options Included: Abatement interface kit Pump Exhaust Assembly - High Capacity Particle Filter Cart Assembly with two exhaust isolation valves - DeviceNet throttle valve for chamber to pump and from pump to abatement system is customer's responsibility Customer Selected Options: - Add Alky #6 upgrade (Cp2Mg Spare) - Low Flow NH3 (NH3 #3) - Low Flow H2 (H2 #2) - Silane Dilution Option - Abatement Interface - Smoke Detector - Line heater for all Alkyls 2- Wafer carriers 300mm - Demo 18- Wafer carriers 300mm - Spare 2- Spare Particle Filter Cartridge (PN - 1094057) - SpareEbara ESA-25 XW Pump - Add 2nd DRT - Remote Recipe Editor and Data Viewer (1 License + 3 user) - SMC Refrigeration Bath - Large - FOUP Cart for 300mm - SECS/GEM License - H2 Purifier with bypass valve network - N2 Purifier with bypass valve network - NH3 Purifier with bypass valve network

Configuration

C-1 Reactor Cart Assembly 300mm GaN: 300mm stainless steel high efficiency water cooled growth chamber Temperature controlled Uniform Flow Flange assembly with temperature & flow monitoring Integrated rotation mechanism, motor, and drive assembly Reactor temperature management system with temperature flow & water level alarms Three zone resistive heater assembly with heat shields, electrical connections & insulators Electronics Control Module: 3Zone DC power supplies for heater power Digital devices on industry-standard DeviceNet digital network Standardized cables & interconnects Capable of facilities UPS (customer supplied) H2 Detector Options included: Abatement interface kit Pump Exhaust Assembly High capacity particle filter cart assembly with two exhaust isolation valves DeviceNet throttle valve for chamber pressure control Exhaust foreline from chamber to pump and from pump to abatement system

OEM Model Description

Veeco’s Propel™ MOCVD system is designed as a flexible platform for early stage research and development and small production needs for nitride applications. The reactor is capable of processing 9×2”, 3×4”, 1×6” and 1×8” on various substrates such as silicon, sapphire and silicon carbide without any hardware modification between runs.The system deposits high-quality GaN films for multiple applications such as power, RF, & photonics. The R200 reactor is based on Veeco’s leading TurboDisc® design including the IsoFlange™ and SymmHeat™ technologies that provide laminar flow and uniform temperature profile across the entire wafer. Customers can easily transfer processes from Veeco D180, K465i™ or MaxBright™ systems to the Propel GaN MOCVD platform.