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Description
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: CX3000 Equipment status: Out of Fab Process: Si3N4 Type: Diffusion Air valve: FUJIKIN Heater: D4EX24196-003 MFC, MFM: HORIBA STEC Three phase power: 3Ø AC 440V Single phase power: 1Ø AC 208V Main/APC: CKD Gas: PN2 / SiH2Cl2 / NH3 / NF3 Others: ROBO 5000Configuration
Process: Si3N4 The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Cooling water unit - Scavenger - Temperature controller The gas subsystem includes the following major components: - Power box ( consists of the primary power supply and the power control system ) - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) - Temperature controller Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM Model Description
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CATEGORY
MOCVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
72891
Wafer Sizes:
12"/300mm
Vintage:
2014
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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CATEGORY
MOCVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
72891
Wafer Sizes:
12"/300mm
Vintage:
2014
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: CX3000 Equipment status: Out of Fab Process: Si3N4 Type: Diffusion Air valve: FUJIKIN Heater: D4EX24196-003 MFC, MFM: HORIBA STEC Three phase power: 3Ø AC 440V Single phase power: 1Ø AC 208V Main/APC: CKD Gas: PN2 / SiH2Cl2 / NH3 / NF3 Others: ROBO 5000Configuration
Process: Si3N4 The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Cooling water unit - Scavenger - Temperature controller The gas subsystem includes the following major components: - Power box ( consists of the primary power supply and the power control system ) - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) - Temperature controller Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM Model Description
None ProvidedDocuments
No documents