Description
Installed and running Equipment status: Operational.Configuration
Previously, the GaN growth was on 4-inch wafers, now it's on 6-inch wafers, all in six pieces. Schematic and circuit data for the equipment. Equipment: Photos of the reaction chamber (upper, inside, and below), and gas source piping with equipment door open. Human-machine interface software version: EpiTT_TWO. PLC, SLC, and RF generator details.OEM Model Description
The AIXTRON AIX 2800 G4 is an advanced metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE. This cutting-edge system is specifically designed for epitaxial growth of compound semiconductor materials, with a primary focus on producing high-performance optoelectronic devices like light-emitting diodes (LEDs) and laser diodes. Its precise and controlled growth process enables the creation of high-quality semiconductor layers, making it a crucial tool for manufacturing optoelectronic components used in various applications, including lighting, displays, telecommunications, and other high-performance electronic devices.Documents
AIXTRON
AIX 2800 G4
Verified
CATEGORY
MOCVD
Key Item Details
Condition:
Used
Operational Status:
Installed / Running
Product ID:
100029
Wafer Sizes:
6"/150mm
Vintage:
2008
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Logistics Support
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Money Back Guarantee
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Transaction Insured by Moov
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Refurbishment Services
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AIXTRON
AIX 2800 G4
Verified
CATEGORY
MOCVD
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Running
Product ID:
100029
Wafer Sizes:
6"/150mm
Vintage:
2008
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available