The PLu neox is the most advanced optical profiler from Sensofar. Based on the successful series of PLu optical surface profilers, the PLu neox covers the broadest range of applications on 3D and thin film metrology due to the combination of confocal scanning, phase shift interferometry, vertical scanning interferometry and spectroscopic reflectometry. This powerful combination allows for fast 2D and 3D analysis of technical surfaces with less than 0.1 nm vertical resolution, the capability to measure steep slopes over 70 degrees on smooth surfaces, and thin film metrology with less than 1 nm of resolution.

SENSOFAR

PLu NEOX

A QA/QC and R&D solution engineered for speed. 3D profiling to the nanometer with 3 optical technologies and the ability to measure smooth and shiny surfaces.
The S Neox measures using confocal, interferometry and focus variation techniques. For the measurement of roughness, surface finish, flatness and waviness on materials such as thin film and wafers.
Ai focus variation – Saves each layer as the lens moves upward allowing you to see shape and curvature.

Confocal – Only allows focused light through allowing you to see the surface structure.
Interferometry – Uses a laser to allow very accurate measurement down to nanometers great for shiny surfaces such as wafers.

Spectroscopic Reflectometry: Perform thickness measurements on transparent layers in a quick, accurate and non-destructive way.

Stitching Process.mov

Sensofar Imaging.mov

Sensofar XYZ movement.mov

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PLu NEOX

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