Description
Wire bonding machineConfiguration
No ConfigurationOEM Model Description
The Metra 7200 is Nanometrics’ advanced overlay metrology and CD measurement system. The Metra’s high throughput and on-board, real-time, stepper-specific modeling provides the fastest time-to-decision for making accurate stepper adjustments. The Metra’s stepper-specific modeling software analyzes every unique stage and lens term to provide the tightest overlay possible, directly improving device performance and yield. Complete analysis can be performed for any stepper including Nikon, Canon, SVGL and Ultratech. The Metra’s analysis uses an embedded version of the ARGUS® stepper modeling library developed by New Vision Systems. In addition, the system’s multi-tasking Windows NT®-based software allows engineering functions, such as recipe creation, to occur simultaneously while production wafers are being measured, thus providing high equipment utilization.Documents
No documents
NANOMETRICS / METRA
7200
Verified
CATEGORY
Metrology
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
65409
Wafer Sizes:
Unknown
Vintage:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
NANOMETRICS / METRA
7200
Verified
CATEGORY
Metrology
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
65409
Wafer Sizes:
Unknown
Vintage:
2007
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Wire bonding machineConfiguration
No ConfigurationOEM Model Description
The Metra 7200 is Nanometrics’ advanced overlay metrology and CD measurement system. The Metra’s high throughput and on-board, real-time, stepper-specific modeling provides the fastest time-to-decision for making accurate stepper adjustments. The Metra’s stepper-specific modeling software analyzes every unique stage and lens term to provide the tightest overlay possible, directly improving device performance and yield. Complete analysis can be performed for any stepper including Nikon, Canon, SVGL and Ultratech. The Metra’s analysis uses an embedded version of the ARGUS® stepper modeling library developed by New Vision Systems. In addition, the system’s multi-tasking Windows NT®-based software allows engineering functions, such as recipe creation, to occur simultaneously while production wafers are being measured, thus providing high equipment utilization.Documents
No documents