Description
No descriptionConfiguration
Technology: Low Conherence IR interferometry for step high measurement Applications: High A/R TSV depth measurement for 200 and 300mm wafer (Via first & Middle) Benefits: Non destructieve Technology Fast and easy to use CCD camera for spot positioning and pattern recognition Adjustable Metrology spot size TSV diameter > 2um A:R up to 30 Calibration and maintenance freeOEM Model Description
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FOGALE Nanotech
DEEPROBE 300-M
Verified
CATEGORY
Metrology
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
65311
Wafer Sizes:
Unknown
Vintage:
2014
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
FOGALE Nanotech
DEEPROBE 300-M
CATEGORY
Metrology
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
65311
Wafer Sizes:
Unknown
Vintage:
2014
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Technology: Low Conherence IR interferometry for step high measurement Applications: High A/R TSV depth measurement for 200 and 300mm wafer (Via first & Middle) Benefits: Non destructieve Technology Fast and easy to use CCD camera for spot positioning and pattern recognition Adjustable Metrology spot size TSV diameter > 2um A:R up to 30 Calibration and maintenance freeOEM Model Description
None ProvidedDocuments
No documents