Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The Varian 350D is a medium current ion implanter that is capable of implanting Boron (B11 or BF2) or Phosphorous (P31) in 4” or 6” wafers with doses of 1E12 to 5E15. Implant energy levels can be adjusted from 10KeV and 200 KeV1. It is set up for 100mm and 150mm round substrates. It has applications in power devices, memory, logic, analog, discrete and MEMS.Documents
No documents
APPLIED MATERIALS (AMAT) / VARIAN
350D
Verified
CATEGORY
Medium Current
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
106503
Wafer Sizes:
6"/150mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View All
APPLIED MATERIALS (AMAT) / VARIAN
350D
CATEGORY
Medium Current
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
106503
Wafer Sizes:
6"/150mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The Varian 350D is a medium current ion implanter that is capable of implanting Boron (B11 or BF2) or Phosphorous (P31) in 4” or 6” wafers with doses of 1E12 to 5E15. Implant energy levels can be adjusted from 10KeV and 200 KeV1. It is set up for 100mm and 150mm round substrates. It has applications in power devices, memory, logic, analog, discrete and MEMS.Documents
No documents