Description
MEDIUM CURRENT ION IMPLANTERConfiguration
No ConfigurationOEM Model Description
The VIISion 80 ion implanter beam line incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer.Documents
No documents
CATEGORY
Medium Current
Last Verified: 6 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
148252
Wafer Sizes:
8"/200mm
Vintage:
1996
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT) / VARIAN
VIISion 80
CATEGORY
Medium Current
Last Verified: 6 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
148252
Wafer Sizes:
8"/200mm
Vintage:
1996
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
MEDIUM CURRENT ION IMPLANTERConfiguration
No ConfigurationOEM Model Description
The VIISion 80 ion implanter beam line incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer.Documents
No documents