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KLA / VISTEC / LEICA LDS3300 C
    Description
    Spare Parts
    Configuration
    No Configuration
    OEM Model Description
    System enables fully automated inspection of the 300mm wafer surface. The system's parallel processing capability allows simultaneous wafer inspection of the front / backside and the edge/bevel – at throughputs of up to 130 wafers per hour. A single rotation of the wafer is sufficient for wafer edge inspection to deliver the detection results and defect images. The image-based technology convinces with 1µm sensitivity and allows for optional high resolution microscopic review of defects.
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    KLA / VISTEC / LEICA

    LDS3300 C

    verified-listing-icon

    Verified

    CATEGORY
    Mask Inspection

    Last Verified: Over 30 days ago

    Key Item Details

    Condition:

    Parts Tool


    Operational Status:

    Unknown


    Product ID:

    101281


    Wafer Sizes:

    2"/50mm


    Vintage:

    2023

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    KLA / VISTEC / LEICA LDS3300 C

    KLA / VISTEC / LEICA

    LDS3300 C

    Mask Inspection
    Vintage: 0Condition: Used
    Last Verified10 days ago

    KLA / VISTEC / LEICA

    LDS3300 C

    verified-listing-icon
    Verified
    CATEGORY
    Mask Inspection
    Last Verified: Over 30 days ago
    listing-photo-21334ddc51264681a7e7ccb76c799883-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75657/21334ddc51264681a7e7ccb76c799883/6476eca612be47d18a79d53f81a7d7c8_1701147371199_mw.jpg
    Key Item Details

    Condition:

    Parts Tool


    Operational Status:

    Unknown


    Product ID:

    101281


    Wafer Sizes:

    2"/50mm


    Vintage:

    2023


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Spare Parts
    Configuration
    No Configuration
    OEM Model Description
    System enables fully automated inspection of the 300mm wafer surface. The system's parallel processing capability allows simultaneous wafer inspection of the front / backside and the edge/bevel – at throughputs of up to 130 wafers per hour. A single rotation of the wafer is sufficient for wafer edge inspection to deliver the detection results and defect images. The image-based technology convinces with 1µm sensitivity and allows for optional high resolution microscopic review of defects.
    Documents

    No documents

    Similar Listings
    View All
    KLA / VISTEC / LEICA LDS3300 C

    KLA / VISTEC / LEICA

    LDS3300 C

    Mask InspectionVintage: 0Condition: UsedLast Verified: 10 days ago
    KLA / VISTEC / LEICA LDS3300 C

    KLA / VISTEC / LEICA

    LDS3300 C

    Mask InspectionVintage: 2023Condition: Parts ToolLast Verified: Over 30 days ago