Description
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The Ultratech TITAN II is a type of wafer stepper that belongs to the Ultratech series of lithography systems. It is capable of handling wafers that range in size from 4 inches to 8 inches, and it has a reticle size of 5 x 5 inches. The system has a projection ratio of 1:1, a lens resolution of 2 micrometers, and a field size of 44 millimeters by 22 millimeters. Additionally, the TITAN II includes a reticle library that has 12 slots and a bar code reader. It also has a stage with a monolithic structure and linear motor drive. The system is equipped with active air isolation to control vibrations and has global alignment accuracy of 120 nanometers in just 3 seconds. The imaging and lens system can achieve feature sizes as small as 2.0 micrometers, with lens distortion of 120 nanometers and colinearity of 80 nanometers. The maximum image area is 55 millimeters by 18 millimeters, and the exposure spectrum is broadband, ranging from 390 nanometers to 450 nanometers. The wafer plane intensity is greater than 1200 milliwatts per square centimeter, with uniformity of 2.0%.Documents
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VEECO / ULTRATECH
TITAN II
Verified
CATEGORY
Lithography
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
72673
Wafer Sizes:
6"/150mm
Vintage:
Unknown
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Logistics Support
Available
Money Back Guarantee
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Transaction Insured by Moov
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Refurbishment Services
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VEECO / ULTRATECH
TITAN II
CATEGORY
Lithography
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
72673
Wafer Sizes:
6"/150mm
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The Ultratech TITAN II is a type of wafer stepper that belongs to the Ultratech series of lithography systems. It is capable of handling wafers that range in size from 4 inches to 8 inches, and it has a reticle size of 5 x 5 inches. The system has a projection ratio of 1:1, a lens resolution of 2 micrometers, and a field size of 44 millimeters by 22 millimeters. Additionally, the TITAN II includes a reticle library that has 12 slots and a bar code reader. It also has a stage with a monolithic structure and linear motor drive. The system is equipped with active air isolation to control vibrations and has global alignment accuracy of 120 nanometers in just 3 seconds. The imaging and lens system can achieve feature sizes as small as 2.0 micrometers, with lens distortion of 120 nanometers and colinearity of 80 nanometers. The maximum image area is 55 millimeters by 18 millimeters, and the exposure spectrum is broadband, ranging from 390 nanometers to 450 nanometers. The wafer plane intensity is greater than 1200 milliwatts per square centimeter, with uniformity of 2.0%.Documents
No documents