Description
Electron-beam lithography systemConfiguration
Known issues: Distorted imaging Control board issue Minimum feature size: 20 nm Beam energy: 100 eV – 30 keV Thermal field emission source Laser-interferometer controlled stage with 2 nm precision Small pieces up to 100 mm wafers Load lock for faster sample loading Laser height sensing for focus correctionOEM Model Description
he Raith e-LiNE is an electron beam lithography tool which utilizes thermal field emission filament technology and a laser-interferometer controlled stage. The system is equipped with a load lock, an automatic height laser sensor, and both In-lens and SE2 detectors.Documents
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RAITH
e-LiNE
CATEGORY
Lithography
Last Verified: 9 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
153432
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Electron-beam lithography systemConfiguration
Known issues: Distorted imaging Control board issue Minimum feature size: 20 nm Beam energy: 100 eV – 30 keV Thermal field emission source Laser-interferometer controlled stage with 2 nm precision Small pieces up to 100 mm wafers Load lock for faster sample loading Laser height sensing for focus correctionOEM Model Description
he Raith e-LiNE is an electron beam lithography tool which utilizes thermal field emission filament technology and a laser-interferometer controlled stage. The system is equipped with a load lock, an automatic height laser sensor, and both In-lens and SE2 detectors.Documents
No documents