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JEOL JBX-6300FS
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    OEM Model Description
    Introducing the JBX-6300FS, a cutting-edge electron beam lithography system. It effortlessly writes patterns down to 8nm (actual result: 5nm) using an electron optical system with a 2.1nm-diameter electron beam at 100kV. Achieving high field-stitching and overlay accuracy of 9nm or less, it ensures exceptional cost performance. JEOL's unique automatic correction function allows high-precision pattern writing. Addressing various needs, from cutting-edge device R&D to nanotechnology and communication-device production, JBX-6300FS sets a new standard in electron beam lithography.
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    JEOL

    JBX-6300FS

    verified-listing-icon

    Verified

    CATEGORY
    Lithography

    Last Verified: Over 30 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    102292


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown

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    JEOL JBX-6300FS

    JEOL

    JBX-6300FS

    Lithography
    Vintage: 0Condition: Used
    Last VerifiedOver 30 days ago

    JEOL

    JBX-6300FS

    verified-listing-icon
    Verified
    CATEGORY
    Lithography
    Last Verified: Over 30 days ago
    listing-photo-032de8cb2cc8424eadffab53df17fbba-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    102292


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    Introducing the JBX-6300FS, a cutting-edge electron beam lithography system. It effortlessly writes patterns down to 8nm (actual result: 5nm) using an electron optical system with a 2.1nm-diameter electron beam at 100kV. Achieving high field-stitching and overlay accuracy of 9nm or less, it ensures exceptional cost performance. JEOL's unique automatic correction function allows high-precision pattern writing. Addressing various needs, from cutting-edge device R&D to nanotechnology and communication-device production, JBX-6300FS sets a new standard in electron beam lithography.
    Documents

    No documents

    Similar Listings
    View All
    JEOL JBX-6300FS

    JEOL

    JBX-6300FS

    LithographyVintage: 0Condition: UsedLast Verified: Over 30 days ago