Description
Primarily used for writing lithography masks with pre-spun photoresist. Recently replaced the laser interferometer encoder and temperature controller for the environmental chamber Manuals are included for the tool, conversion software, laser encoder, and temperature controller.Configuration
405nm laser with a 4mm write head Working software both to convert and write on two computers (GDSII was the go-to format, has other file format options, including Grayscale Can handle large substrates up to 9x9" Maximum write field up to 200mmOEM Model Description
None ProvidedDocuments
No documents
Verified
CATEGORY
Lithography
Last Verified: 3 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
145810
Wafer Sizes:
Unknown
Vintage:
2009
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
HEIDELBERG INSTRUMENTS
DWL 66FS
CATEGORY
Lithography
Last Verified: 3 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
145810
Wafer Sizes:
Unknown
Vintage:
2009
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Primarily used for writing lithography masks with pre-spun photoresist. Recently replaced the laser interferometer encoder and temperature controller for the environmental chamber Manuals are included for the tool, conversion software, laser encoder, and temperature controller.Configuration
405nm laser with a 4mm write head Working software both to convert and write on two computers (GDSII was the go-to format, has other file format options, including Grayscale Can handle large substrates up to 9x9" Maximum write field up to 200mmOEM Model Description
None ProvidedDocuments
No documents