The DWL 66 is a precise, maskless laser lithography system for various applications like maskless lithography, photomask making, and direct writing. It supports gray-scale exposures on flat, photosensitive-coated materials. Key features include a minimum feature size of 0.6 microns, substrate size up to 200 x 200 mm, and over 1.0M dpi resolution using a 20-nanometer address grid.

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DWL 66

DWL 200	

The MLA 300 features our powerful Maskless Aligner technology that has been specifically adapted to the requirements of high-throughput production applications: You can now employ the unmatched flexibility of maskless lithography in an industrial setting, on wafers with sizes up to 300 x 300 mm2. Lithography no longer depends on a fixed mask, but can dynamically adapt to surface and process variations from previous fabrication steps.

MLA 300

A maskless lithography tool with areas of application include nanofabrication of quantum devices (2D materials, semiconductor materials, nanowires, etc) MEMS, micro-optic elements, sensors, actuators, MOEMS and other devices for materials and life sciences.

MLA 150 

DWL 2000

UPG
The μPG 101 is an easy-to-use micro pattern generator for direct writing applications and low volume mask making. The system can be used for applications like MEMS, BioMEMS, Integrated Optics, and Micro Fluidics. 

-Substrates up to 100 x 100 mm2
-Critical dimension resolution is 3 μm
-Address grid down to 120 nm for the 3 μm.
-Multiple data input formats (DXF, CIF, BMP)
-Camera system for alignment



μPG 101

NanoFrazor lithography systems are based on thermal scanning probe lithography. Core of the NanoFrazor technology is an ultra-sharp heatable probe tip which is used for writing and simultaneous inspection of complex nanostructures. The heated tip creates arbitrary, high-resolution nanostructures by local sublimation of resists. Standard pattern transfer methods like lift-off or etching can be applied. 

NANOFRAZOR EXPLORE

DWL 66+

DWL 4000

The MLA 100 Maskless Aligner features an intuitive user interface, a simple loading procedure, and advanced, reliable technology. The MLA100 has extreme exposure speed. In less than 10 minutes, an area 100×100 mm² with structures as small as 1 micron can be exposed. Alignment in multi-layer applications can also be achieved quickly as the product’s three integrated cameras with varying resolutions enable alignment to be obtained within 2 minutes.

MLA 100

The µPG 501 is a tabletop maskless aligner system (Figure 1). It can be used for direct-writing as well as for making photomasks. It uses 390 nm LED light source and optical system comprising highly reflective mirrors and DMDTM (digital micro-mirror device).

µPG 501

small and midsize Maskless Aligner Systems

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DWL 66

MLA 300

DWL 200

MLA 100

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