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HEIDELBERG INSTRUMENTS DWL 66
    Description
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    Configuration
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    OEM Model Description
    The DWL 66 is a precise, maskless laser lithography system for various applications like maskless lithography, photomask making, and direct writing. It supports gray-scale exposures on flat, photosensitive-coated materials. Key features include a minimum feature size of 0.6 microns, substrate size up to 200 x 200 mm, and over 1.0M dpi resolution using a 20-nanometer address grid.
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    HEIDELBERG INSTRUMENTS

    DWL 66

    verified-listing-icon

    Verified

    CATEGORY

    Lithography
    Last Verified: Over 60 days ago
    Key Item Details
    Condition:

    Parts Tool

    Operational Status:

    Unknown

    Product ID:

    63409

    Wafer Sizes:

    Unknown

    Vintage:

    Unknown

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    HEIDELBERG INSTRUMENTS DWL 66
    HEIDELBERG INSTRUMENTSDWL 66Lithography
    Vintage: 0Condition: Parts Tool
    Last VerifiedOver 60 days ago
    HEIDELBERG INSTRUMENTS DWL 66
    HEIDELBERG INSTRUMENTSDWL 66Lithography
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    HEIDELBERG INSTRUMENTS

    DWL 66

    verified-listing-icon

    Verified

    CATEGORY

    Lithography
    Last Verified: Over 60 days ago
    listing-photo-28202e39b98d4bbe956667dbf8aeea2e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/46481/28202e39b98d4bbe956667dbf8aeea2e/057bdc1dc0a24ca487b57a270bb62e34_7416bd3648c24b578b59e12982b6d8e01201a_mw.jpeg
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    Key Item Details
    Condition:

    Parts Tool

    Operational Status:

    Unknown

    Product ID:

    63409

    Wafer Sizes:

    Unknown

    Vintage:

    Unknown

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The DWL 66 is a precise, maskless laser lithography system for various applications like maskless lithography, photomask making, and direct writing. It supports gray-scale exposures on flat, photosensitive-coated materials. Key features include a minimum feature size of 0.6 microns, substrate size up to 200 x 200 mm, and over 1.0M dpi resolution using a 20-nanometer address grid.
    Documents

    No documents

    Similar Listings
    View All
    HEIDELBERG INSTRUMENTS DWL 66
    HEIDELBERG INSTRUMENTS
    DWL 66
    LithographyVintage: 0Condition: Parts ToolLast Verified: Over 60 days ago
    HEIDELBERG INSTRUMENTS DWL 66
    HEIDELBERG INSTRUMENTS
    DWL 66
    LithographyVintage: 0Condition: UsedLast Verified: Over 60 days ago