Description
No descriptionConfiguration
High CurrentOEM Model Description
iStar is a low energy, high current batch mode ion implanter suitable for ultra shallow junction (USJ) formation for advanced technology nodes. Its tall beam design is a breakthrough technology that achieves high beam current (2mA) at extremely low energy (100eV) without sacrificing throughput. The low energy beam current for iStar is about 2x to 4x higher than other high current implanters AIBT claimed.Documents
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ADVANCED ION BEAM TECHNOLOGY INC (AIBT)
iSTAR
Verified
CATEGORY
Ion Implantation
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
59425
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ADVANCED ION BEAM TECHNOLOGY INC (AIBT)
iSTAR
CATEGORY
Ion Implantation
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
59425
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
High CurrentOEM Model Description
iStar is a low energy, high current batch mode ion implanter suitable for ultra shallow junction (USJ) formation for advanced technology nodes. Its tall beam design is a breakthrough technology that achieves high beam current (2mA) at extremely low energy (100eV) without sacrificing throughput. The low energy beam current for iStar is about 2x to 4x higher than other high current implanters AIBT claimed.Documents
No documents