VIISTA PLAD T2 implanter and monitor processes 12” Wafers with its single wafer plasma doping system. The plasma implant voltage ranges from 200V to 10KV. It uses Ramped Wafer Bias that is programmed for optimum Dopant Profile Control and real-time magnetically suppressed Faraday closed loop dose control system.

November 10, 2011 – Applied Materials, Inc. announced the successful completion of its acquisition of Varian Semiconductor Equipment Associates, Inc. 
Varian is the leading supplier of ion implantation equipment used by chip makers and has been applying this technology to crystalline silicon wafers for photovoltaic panels. Varian will operate as a business unit of Applied's Silicon Systems Group.

VIISta PLAD T2

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