Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The system offers a resolution of 0.35 microns utilizing a 365 nanometer wavelength I-line lens. It can process 87 or more 200mm wafers per hour with an alignment accuracy of 50nm or higher. The exposure area measures 22x22mm, and it has a reduction ratio of five to one.Documents
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NIKON
NSR-2205i14E
Verified
CATEGORY
I-Line
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
79733
Wafer Sizes:
6"/150mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
NIKON
NSR-2205i14E
Verified
CATEGORY
I-Line
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
79733
Wafer Sizes:
6"/150mm
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The system offers a resolution of 0.35 microns utilizing a 365 nanometer wavelength I-line lens. It can process 87 or more 200mm wafers per hour with an alignment accuracy of 50nm or higher. The exposure area measures 22x22mm, and it has a reduction ratio of five to one.Documents
No documents