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NIKON NSR-2205i12D
    Description
    No description
    Configuration
    Configuration: 200mm Notch Wafer Type Wafer Stage : 200mm Ring and Ball Screw Type Reticle Alignment : SRA and VRA Wafer Alignment : LSA and FIA Auto Focus : Multi Wafer Loader : Type3, Left In-Line, Left/Right/Extra Cassette Reticle Loader : 150mm, Single Library Barcode System Sendai S19 Chamber Lens Data: Total Focus Deviation: 0.287 µm Astigmatism: 0.187 µm Inclination: UR-LL : -0.023, UL-LR : 0.086 µm Lens Distortion: X : -0.027 - 0.041 µm, Y: -0.035 - 0.025µm Reticle Blind: 0.6nm - 0.65mm Focus Calibration Repeatability 42nm Expose Poweer: 755.098mw/cm2 Illumination Uniformity: 0.9% Reticle Rotation: 4nm FIA Overlay: X : 59nm, Y : 66nm LSA Overlay: X : 62nm, Y : 62nm Orthogonality: -0.010sec Stepping Accuracy (STEP): X: 21nm Y : 39nm Pre2 Pre-alignment Repeatability: Y : 3.148 Y-T : 5.438 X : 2.220 Wafer Holder Flatness: 0.92µm Wafer Loading Test: Good Reticle Loading Test: Good
    OEM Model Description
    "This i-line stepper from Nikon is one of our most popular lithography systems. Resolution ≦ 350 nm, exposure light source i-line (365 nm wavelength), reduction ratio 1:5, exposure field 22mm square to 17.9 (H) × 25.2 (V) mm (6-inch reticle), 20.0 × 20.4 mm (5-inch reticle), alignment accuracy (EGA, |M| + 3σ) ≦ 55 nm. The NIKON NSR 2205 i12D is a Steppers and Scanners system. The NSR 2205 i12D can be used with 8” wafer sizes.
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    NIKON

    NSR-2205i12D

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    Verified

    CATEGORY

    I-Line
    Last Verified: 22 days ago
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    102664


    Wafer Sizes:

    8"/200mm


    Vintage:

    1997

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    NIKON

    NSR-2205i12D

    verified-listing-icon

    Verified

    CATEGORY

    I-Line
    Last Verified: 22 days ago
    listing-photo-539d2ffacfbc4e2e92a481941ac53e1b-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    102664


    Wafer Sizes:

    8"/200mm


    Vintage:

    1997


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    Configuration: 200mm Notch Wafer Type Wafer Stage : 200mm Ring and Ball Screw Type Reticle Alignment : SRA and VRA Wafer Alignment : LSA and FIA Auto Focus : Multi Wafer Loader : Type3, Left In-Line, Left/Right/Extra Cassette Reticle Loader : 150mm, Single Library Barcode System Sendai S19 Chamber Lens Data: Total Focus Deviation: 0.287 µm Astigmatism: 0.187 µm Inclination: UR-LL : -0.023, UL-LR : 0.086 µm Lens Distortion: X : -0.027 - 0.041 µm, Y: -0.035 - 0.025µm Reticle Blind: 0.6nm - 0.65mm Focus Calibration Repeatability 42nm Expose Poweer: 755.098mw/cm2 Illumination Uniformity: 0.9% Reticle Rotation: 4nm FIA Overlay: X : 59nm, Y : 66nm LSA Overlay: X : 62nm, Y : 62nm Orthogonality: -0.010sec Stepping Accuracy (STEP): X: 21nm Y : 39nm Pre2 Pre-alignment Repeatability: Y : 3.148 Y-T : 5.438 X : 2.220 Wafer Holder Flatness: 0.92µm Wafer Loading Test: Good Reticle Loading Test: Good
    OEM Model Description
    "This i-line stepper from Nikon is one of our most popular lithography systems. Resolution ≦ 350 nm, exposure light source i-line (365 nm wavelength), reduction ratio 1:5, exposure field 22mm square to 17.9 (H) × 25.2 (V) mm (6-inch reticle), 20.0 × 20.4 mm (5-inch reticle), alignment accuracy (EGA, |M| + 3σ) ≦ 55 nm. The NIKON NSR 2205 i12D is a Steppers and Scanners system. The NSR 2205 i12D can be used with 8” wafer sizes.
    Documents
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    View All
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