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APPLIED MATERIALS (AMAT) / VARIAN VIISta 80
    Description
    No description
    Configuration
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    OEM Model Description
    The high current VIISta 80HP and VIISta 80 ion implanters feature a patented dual magnet ribbon beam architecture that currently provides the highest productivity, implant angle accuracy and 60 degree tilt angle capability—all of which are required for advanced device fabrication. Both tools have excellent process control capability for advanced ultra shallow junction applications, and can be used for source/drain, source drain extension, gate doping, pre-amorphization, and materials modification applications. Varian Semiconductor’s other high current tools include the VIISion 80 PLUS and VIISion 200 PLUS ion implanters.
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    APPLIED MATERIALS (AMAT) / VARIAN

    VIISta 80

    verified-listing-icon

    Verified

    CATEGORY
    High Current

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    31665


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown

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    APPLIED MATERIALS (AMAT) / VARIAN VIISta 80

    APPLIED MATERIALS (AMAT) / VARIAN

    VIISta 80

    High Current
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    APPLIED MATERIALS (AMAT) / VARIAN

    VIISta 80

    verified-listing-icon
    Verified
    CATEGORY
    High Current
    Last Verified: Over 60 days ago
    listing-photo-caa8693fe4f1401888047de050694c9e-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    31665


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The high current VIISta 80HP and VIISta 80 ion implanters feature a patented dual magnet ribbon beam architecture that currently provides the highest productivity, implant angle accuracy and 60 degree tilt angle capability—all of which are required for advanced device fabrication. Both tools have excellent process control capability for advanced ultra shallow junction applications, and can be used for source/drain, source drain extension, gate doping, pre-amorphization, and materials modification applications. Varian Semiconductor’s other high current tools include the VIISion 80 PLUS and VIISion 200 PLUS ion implanters.
    Documents

    No documents

    Similar Listings
    View All
    APPLIED MATERIALS (AMAT) / VARIAN VIISta 80

    APPLIED MATERIALS (AMAT) / VARIAN

    VIISta 80

    High CurrentVintage: 0Condition: UsedLast Verified: Over 60 days ago