Description
No descriptionConfiguration
No ConfigurationOEM Model Description
LCT Series • LCT Poly / LCT SiN: Configured with specific gas delivery lines for Low-Pressure Chemical Vapor Deposition (LPCVD) of Polysilicon or Silicon Nitride. • LCT Oxide / LCT Oxide-AL: Built with torch or steam systems specifically for thermal oxidation. • LCT Anneal: Configured with inert gas flows (like N₂ or H₂/N₂ forming gas) for high-temperature annealing.Documents
No documents
Verified
CATEGORY
Furnaces / Diffusion
Last Verified: 2 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
155101
Wafer Sizes:
12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KOKUSAI-ELECTRIC (KE)
LCT
CATEGORY
Furnaces / Diffusion
Last Verified: 2 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
155101
Wafer Sizes:
12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
LCT Series • LCT Poly / LCT SiN: Configured with specific gas delivery lines for Low-Pressure Chemical Vapor Deposition (LPCVD) of Polysilicon or Silicon Nitride. • LCT Oxide / LCT Oxide-AL: Built with torch or steam systems specifically for thermal oxidation. • LCT Anneal: Configured with inert gas flows (like N₂ or H₂/N₂ forming gas) for high-temperature annealing.Documents
No documents