Description

Purpose: Al2O3 ALD Film deposition -Monolayer Al2O3 or TiO2 deposition -Thermal chemical reaction for deposition. -Batch type process. ~Å to 10nm is the typical process. -300oC is the typical setting for deposition.

Configuration

Chemicals: TMA, TiCl4 Process type: Batch type process Pumping system: -Ebrara M802N-BE*2, -Ebrara EV-S20P*2 (1 set for service, 1 set for spare) Local Scrubber: Kanken Techno KT1000MFH Foundation: 1* Standalone type

OEM Model Description

"VERTRON-III(J3). Model Numbers: DD-853V/DJ-853V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers. The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."

Documents

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KOKUSAI-ELECTRIC (KE)

DJ 853V

Verified

Furnaces / Diffusion

Last Verified: 2 days ago

Key Item Details

Condition:

New

Operational Status:

Unknown

Product ID:

147938

Wafer Sizes:

Unknown

Vintage:

2021

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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