Description
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: CX1000 Equipment status: Out of Fab Process: N2 ANNEAL Type: Diffusion Air valve: FUJIKIN MFC, MFM: STEC Three phase power: 3Ø AC 200V Single phase power: 1Ø AC 200V Main/APC: EC-5000 Gas: N2Configuration
Process: N2 ANNEAL The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Cooling water unit - Scavenger - Temperature controller The gas subsystem includes the following major components: - Power box ( consists of the primary power supply and the power control system ) - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) - Temperature controller Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM Model Description
DD-802V for diffusion. The vertical reactor can accommodate 120 150mm wafers and up to 165 in the future.Documents
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KOKUSAI-ELECTRIC (KE)
DD-802V
Verified
CATEGORY
Furnaces / Diffusion
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
72844
Wafer Sizes:
6"/150mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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KOKUSAI-ELECTRIC (KE)
DD-802V
CATEGORY
Furnaces / Diffusion
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
72844
Wafer Sizes:
6"/150mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: CX1000 Equipment status: Out of Fab Process: N2 ANNEAL Type: Diffusion Air valve: FUJIKIN MFC, MFM: STEC Three phase power: 3Ø AC 200V Single phase power: 1Ø AC 200V Main/APC: EC-5000 Gas: N2Configuration
Process: N2 ANNEAL The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Cooling water unit - Scavenger - Temperature controller The gas subsystem includes the following major components: - Power box ( consists of the primary power supply and the power control system ) - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) - Temperature controller Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM Model Description
DD-802V for diffusion. The vertical reactor can accommodate 120 150mm wafers and up to 165 in the future.Documents
No documents