Description
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4 Tubes (2 Atmospheric / 2 LPCVD) Tube 1 - (Atm) Diffusion growth of SiO2 films utilizing either ‘Thermal’ or ‘Wet’ oxidation (up to 1100C) Tube 2 - (Atm) Forming gas anneal (up to 800C) Tube 3 - LPCVD SiO2 deposition at lower temperatures (up to 800C) Tube 4 - LPCVD Si3N4 (up to 800C)OEM Model Description
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EXPERTECH
HTR
Verified
CATEGORY
Furnaces / Diffusion
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
103682
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
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Transaction Insured by Moov
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Available
EXPERTECH
HTR
CATEGORY
Furnaces / Diffusion
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
103682
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
4 Tubes (2 Atmospheric / 2 LPCVD) Tube 1 - (Atm) Diffusion growth of SiO2 films utilizing either ‘Thermal’ or ‘Wet’ oxidation (up to 1100C) Tube 2 - (Atm) Forming gas anneal (up to 800C) Tube 3 - LPCVD SiO2 deposition at lower temperatures (up to 800C) Tube 4 - LPCVD Si3N4 (up to 800C)OEM Model Description
FurnanceDocuments
No documents