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LAM RESEARCH CORPORATION 2300 CORONUS
    Description
    Wafer Edge Cleaning - Plasma
    Configuration
    No Configuration
    OEM Model Description
    The 2300 Coronus is a plasma-based bevel clean system developed by Lam Research. It removes yield-limiting defect sources from the wafer edge, maximizing yield. The system combines plasma cleaning with proprietary confinement technology to protect the die area. It is flexible and robust, allowing for removal of different materials within the same chamber for a wide range of wafer cleaning applications. The Coronus system incorporates Lam Research’s Dynamic Alignment technology for highly accurate wafer placement and encroachment control.
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    LAM RESEARCH CORPORATION

    2300 CORONUS

    verified-listing-icon

    Verified

    CATEGORY

    Etch/Asher
    Last Verified: Over 30 days ago
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    91746


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown

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    LAM RESEARCH CORPORATION 2300 CORONUS
    LAM RESEARCH CORPORATION2300 CORONUSEtch/Asher
    Vintage: 0Condition: Used
    Last VerifiedOver 30 days ago

    LAM RESEARCH CORPORATION

    2300 CORONUS

    verified-listing-icon

    Verified

    CATEGORY

    Etch/Asher
    Last Verified: Over 30 days ago
    listing-photo-2a7f78ab185b47db99dc8e089f903502-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    91746


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Wafer Edge Cleaning - Plasma
    Configuration
    No Configuration
    OEM Model Description
    The 2300 Coronus is a plasma-based bevel clean system developed by Lam Research. It removes yield-limiting defect sources from the wafer edge, maximizing yield. The system combines plasma cleaning with proprietary confinement technology to protect the die area. It is flexible and robust, allowing for removal of different materials within the same chamber for a wide range of wafer cleaning applications. The Coronus system incorporates Lam Research’s Dynamic Alignment technology for highly accurate wafer placement and encroachment control.
    Documents

    No documents

    Similar Listings
    View All
    LAM RESEARCH CORPORATION 2300 CORONUS
    LAM RESEARCH CORPORATION
    2300 CORONUS
    Etch/AsherVintage: 0Condition: UsedLast Verified: Over 30 days ago
    LAM RESEARCH CORPORATION 2300 CORONUS
    LAM RESEARCH CORPORATION
    2300 CORONUS
    Etch/AsherVintage: 0Condition: UsedLast Verified: Over 30 days ago
    LAM RESEARCH CORPORATION 2300 CORONUS
    LAM RESEARCH CORPORATION
    2300 CORONUS
    Etch/AsherVintage: 0Condition: UsedLast Verified: Over 30 days ago