Description
For EGV-30GX Vertical Eqitaxial Reactor System 4"Susceptor NuFlare EGV-30GX 4" Susceptor (Covalent Material) φ740mm The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.Configuration
Size: - φ740mm - φ100mm Thickness: - 14.4mm Weight: - 10KgOEM Model Description
Epitaxial reactor (CVD/epitaxial growth system) used in semiconductor manufacturingDocuments
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NUFLARE
EGV-30GX
CATEGORY
Epitaxial deposition (EPI)
Last Verified: 13 days ago
Key Item Details
Condition:
Parts Tool
Operational Status:
Unknown
Product ID:
152533
Wafer Sizes:
Unknown
Vintage:
2015
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
For EGV-30GX Vertical Eqitaxial Reactor System 4"Susceptor NuFlare EGV-30GX 4" Susceptor (Covalent Material) φ740mm The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.Configuration
Size: - φ740mm - φ100mm Thickness: - 14.4mm Weight: - 10KgOEM Model Description
Epitaxial reactor (CVD/epitaxial growth system) used in semiconductor manufacturingDocuments
No documents