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Description
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Centura 5200 TCPP - Single Chamber Radiance Plus Included: - Gen Rack - AC Box / Controller - 2 TAN ox chambers still on the tool - Widebody load lock - HP Robot Not Included: - 2 XE chambers removed properly from the toolOEM Model Description
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTPDocuments
No documents
CATEGORY
Epitaxial deposition (EPI)
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
73468
Wafer Sizes:
Unknown
Vintage:
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA 5200 TPCC
CATEGORY
Epitaxial deposition (EPI)
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
73468
Wafer Sizes:
Unknown
Vintage:
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Centura 5200 TCPP - Single Chamber Radiance Plus Included: - Gen Rack - AC Box / Controller - 2 TAN ox chambers still on the tool - Widebody load lock - HP Robot Not Included: - 2 XE chambers removed properly from the toolOEM Model Description
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTPDocuments
No documents