Description
Ellipso MeterConfiguration
Elli-SE-(UV)-FM12 Elli - SE System Specification FEATURE Easy Operation & Fast Measurement Non-contact & Non-destructive High Reproducibility 2D, 3D Mapping Data Display Multi-Layer Measurement 1.0. Performance 1.1 Wavelength range 240 nm~1,000 nm 1.2 Beam spot size ≥ 1.5 mm 1.3 Measuring constants Film thickness, n, k vs λ 1.4Thickness range sub Å ~ 10 μm (depends on film type) 1.5 Number of layers Up to 10 layers (depends on film type) 1.6 Throughput 1 10~15sec. per point (depends on film type) Option: High speed measurement 1.5sec. per point 1.7 Repeatability2 (3σ) ± 0.3 Å on 10 times measurement 1.8 Dispersion relations Cauchy, Sellmeier, Lorentz, Tauc-Lorentz, Quantum-Mechanical and more 1.9 Providing features Refractive Index, Extinction coefficient and optical band gap Film density and composition Material’s dielectrics function library User defined model capability Elli- SE- U System Specification 2.0. Ellipsometer system 2.1. Light source Tungsten halogen & Deuterium lamp (200 nm ~ 1,000 nm) Collimating lens system 2.2. Spot size Standard ≥ 1.5 mm 2.3. Polarizer module UV Collimating optic system Rotating polarizer: Micro Stepping motor control 2.4. Analyzer module UV Collimating optic system Rotating analyzer: Micro Stepping motor control 2.5. Spectrograph Wavelength range : 240 nm ~ 1,000 nm (CCD Type) Resolution : 1.5 nm FWHM, 2.6. Angle of incidence Manually variable angle of incidence 55˚~ 90˚ (5˚ Step) 2.7. Ellipsometric angles Psi : Range, 0˚ ~ 90˚ Repeatability, ≤ ± 0.02˚ Delta : Range, 0˚ ~ 180˚ Repeatability, ≤ ± 0.10˚ with retarder 2.8. Collimating system Auto Collimator 2.9. Auto 2D Mapping Stage 12 inch (300 mm Circle type) Mapping Software, Automatic Stage Control 3.0. Applications 3.1. Semiconductor Si, Ge, ONO, ZnO, PR, poly-Si, GaN, GaAs, Si3N4 3.2. Display(incl. OLED) MgO, ITO, PR, Alq3 , CuPc, PVK, PAF, PEDT-PSS, NPB, SiO2 ,ONO 3.3. Dielectrics SiO2 , TiO2 , Ta2O5 , ITO, AIN, ZrO2 , Si3N4 , Ga2O3 , Wet oxides 3.4. Polymer Dye, NPB, MNA, PVA, PET, TAC, PR 3.5. Chemistry Organic film(OLED) & LB Thin film 3.6. Solar cell SiN, a-Si, poly-Si, SiO2 , Al2O3 4.0. Foot print and weight 4.1. Foot print 600mm(H) x 480mm(D) x 630mm(W) ( excluding computer system) 4.2. Weight 35kgOEM Model Description
Measuring constants: Film thickness, n, k vs λ Thickness range: sub Å ~ 10 μm (depends on film type) Wavelength range: 220 ~ 850 nm (uv) or 380 ~ 1050 nm Option of Spectral Range - (Duv:193nm, IR: 900nm ~ 1700nm, 900nm~ 2,200nm)Documents
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Ellipso Technology
Elli-SE
Verified
CATEGORY
Elipsometry
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
89696
Wafer Sizes:
Unknown
Vintage:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Ellipso Technology
Elli-SE
CATEGORY
Elipsometry
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
89696
Wafer Sizes:
Unknown
Vintage:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Ellipso MeterConfiguration
Elli-SE-(UV)-FM12 Elli - SE System Specification FEATURE Easy Operation & Fast Measurement Non-contact & Non-destructive High Reproducibility 2D, 3D Mapping Data Display Multi-Layer Measurement 1.0. Performance 1.1 Wavelength range 240 nm~1,000 nm 1.2 Beam spot size ≥ 1.5 mm 1.3 Measuring constants Film thickness, n, k vs λ 1.4Thickness range sub Å ~ 10 μm (depends on film type) 1.5 Number of layers Up to 10 layers (depends on film type) 1.6 Throughput 1 10~15sec. per point (depends on film type) Option: High speed measurement 1.5sec. per point 1.7 Repeatability2 (3σ) ± 0.3 Å on 10 times measurement 1.8 Dispersion relations Cauchy, Sellmeier, Lorentz, Tauc-Lorentz, Quantum-Mechanical and more 1.9 Providing features Refractive Index, Extinction coefficient and optical band gap Film density and composition Material’s dielectrics function library User defined model capability Elli- SE- U System Specification 2.0. Ellipsometer system 2.1. Light source Tungsten halogen & Deuterium lamp (200 nm ~ 1,000 nm) Collimating lens system 2.2. Spot size Standard ≥ 1.5 mm 2.3. Polarizer module UV Collimating optic system Rotating polarizer: Micro Stepping motor control 2.4. Analyzer module UV Collimating optic system Rotating analyzer: Micro Stepping motor control 2.5. Spectrograph Wavelength range : 240 nm ~ 1,000 nm (CCD Type) Resolution : 1.5 nm FWHM, 2.6. Angle of incidence Manually variable angle of incidence 55˚~ 90˚ (5˚ Step) 2.7. Ellipsometric angles Psi : Range, 0˚ ~ 90˚ Repeatability, ≤ ± 0.02˚ Delta : Range, 0˚ ~ 180˚ Repeatability, ≤ ± 0.10˚ with retarder 2.8. Collimating system Auto Collimator 2.9. Auto 2D Mapping Stage 12 inch (300 mm Circle type) Mapping Software, Automatic Stage Control 3.0. Applications 3.1. Semiconductor Si, Ge, ONO, ZnO, PR, poly-Si, GaN, GaAs, Si3N4 3.2. Display(incl. OLED) MgO, ITO, PR, Alq3 , CuPc, PVK, PAF, PEDT-PSS, NPB, SiO2 ,ONO 3.3. Dielectrics SiO2 , TiO2 , Ta2O5 , ITO, AIN, ZrO2 , Si3N4 , Ga2O3 , Wet oxides 3.4. Polymer Dye, NPB, MNA, PVA, PET, TAC, PR 3.5. Chemistry Organic film(OLED) & LB Thin film 3.6. Solar cell SiN, a-Si, poly-Si, SiO2 , Al2O3 4.0. Foot print and weight 4.1. Foot print 600mm(H) x 480mm(D) x 630mm(W) ( excluding computer system) 4.2. Weight 35kgOEM Model Description
Measuring constants: Film thickness, n, k vs λ Thickness range: sub Å ~ 10 μm (depends on film type) Wavelength range: 220 ~ 850 nm (uv) or 380 ~ 1050 nm Option of Spectral Range - (Duv:193nm, IR: 900nm ~ 1700nm, 900nm~ 2,200nm)Documents
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