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6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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ULVAC ENVIRO
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The ENVIRO™ Advanced Dry Strip System is a single wafer load-locked MESC compatible cluster tool designed to strip photoresist and etch sidewall polymers (veils) using precise optical end-point detection, downstream microwave, and non-damage RIE modes. It is excellent for eliminating wet solvent/acid stripper and can be used for post-high dose implant photo-resist stripping, post-metal etch photoresist stripping, post-via/contact etch photoresist stripping, and post-poly/polycide etch photoresist stripping. The dual chamber configuration can be operated in high throughput or independent parallel processing mode, and the control system features Windows™ based software, off-line recipe editing, SECS/GEM communication, and extensive data logging. It is an advanced dry strip system from Phoenix that offers a range of features and applications.
    Documents

    No documents

    ULVAC

    ENVIRO

    verified-listing-icon

    Verified

    CATEGORY
    Dry / Plasma Etch

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    46768


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    ULVAC ENVIRO

    ULVAC

    ENVIRO

    Dry / Plasma Etch
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    ULVAC

    ENVIRO

    verified-listing-icon
    Verified
    CATEGORY
    Dry / Plasma Etch
    Last Verified: Over 60 days ago
    listing-photo-68f0e633ebf54f96b44e4cfb4434db51-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1689/46768/75e43a4bf1ef4dcfaa958e9525ce67af_3969399f3cae44f5bd265e484ccb91f5image86rotated_mw.jpeg
    listing-photo-68f0e633ebf54f96b44e4cfb4434db51-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1689/46768/09dd65c61c4c4310ba8f4dd93770c845_0136997c5eb34d2197dcd3261c5ea2c0image87_mw.jpeg
    listing-photo-68f0e633ebf54f96b44e4cfb4434db51-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1689/46768/048fc5241f014f87a5f639b286a9fe52_52f003e5cc0745ad98b7a887a71c3130image88_mw.jpeg
    listing-photo-68f0e633ebf54f96b44e4cfb4434db51-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1689/46768/91b9f2879bd94ab2a018a23ede3cf4ae_cd8df3b0887d428eb7b375c4a865d22aimage89rotated_mw.jpeg
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    46768


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The ENVIRO™ Advanced Dry Strip System is a single wafer load-locked MESC compatible cluster tool designed to strip photoresist and etch sidewall polymers (veils) using precise optical end-point detection, downstream microwave, and non-damage RIE modes. It is excellent for eliminating wet solvent/acid stripper and can be used for post-high dose implant photo-resist stripping, post-metal etch photoresist stripping, post-via/contact etch photoresist stripping, and post-poly/polycide etch photoresist stripping. The dual chamber configuration can be operated in high throughput or independent parallel processing mode, and the control system features Windows™ based software, off-line recipe editing, SECS/GEM communication, and extensive data logging. It is an advanced dry strip system from Phoenix that offers a range of features and applications.
    Documents

    No documents

    Similar Listings
    View All
    ULVAC ENVIRO

    ULVAC

    ENVIRO

    Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days ago
    ULVAC ENVIRO

    ULVAC

    ENVIRO

    Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days ago
    ULVAC ENVIRO

    ULVAC

    ENVIRO

    Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days ago