
Description
ICP Etcher CompleteConfiguration
Was used to process Gallium Nitride and diamond Configured for chlorinated plasmas (Cl2 and BCL3 MFC fitted) with also Ar, O2 and N2.OEM Model Description
None ProvidedDocuments
No documents
STS
PRO ICP
CATEGORY
Dry / Plasma Etch
Last Verified: 4 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
145586
Wafer Sizes:
Unknown
Vintage:
2007
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
ICP Etcher CompleteConfiguration
Was used to process Gallium Nitride and diamond Configured for chlorinated plasmas (Cl2 and BCL3 MFC fitted) with also Ar, O2 and N2.OEM Model Description
None ProvidedDocuments
No documents