Description
ICP RIE Cluster Tool, 3-chamber. Includes: 1ea control cabinet w/ PDUs/control computers; 2ea control cabinets w/ PDUs, Leybold Mag Drive 1000 controller, VAT PM-7 adaptive pressure controller; 6ea ENI Genesis-series RF generators; 4ea ENI ACG-10B RF generators; 2ea Ebara A25S vacuum pumps; 2ea Thermo Neslab Merlin M75 recirculating chillers. Missing turbopumps.Configuration
No ConfigurationOEM Model Description
STS Multiplex is a type of etcher that offers a large range of materials etching possibility such as insulators (SiO2, Si3N4 and SiC), silicon, metals (Al Alloys, Pt, Ti) and some polymers. It is dedicated for etching metals (processes under chlorine chemistry), quartz (fluorine/carbonate chemistry) and polyimide (oxygen chemistry). STS offers a range of different platform options, each compatible with all STS process technologies. The Multiplex has a single process chamber with manually loaded vacuum loadlock and carousel wafer handler for 2-4 wafers.Documents
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STS
MULTIPLEX
CATEGORY
Dry / Plasma Etch
Last Verified: 17 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
149270
Wafer Sizes:
6"/150mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
ICP RIE Cluster Tool, 3-chamber. Includes: 1ea control cabinet w/ PDUs/control computers; 2ea control cabinets w/ PDUs, Leybold Mag Drive 1000 controller, VAT PM-7 adaptive pressure controller; 6ea ENI Genesis-series RF generators; 4ea ENI ACG-10B RF generators; 2ea Ebara A25S vacuum pumps; 2ea Thermo Neslab Merlin M75 recirculating chillers. Missing turbopumps.Configuration
No ConfigurationOEM Model Description
STS Multiplex is a type of etcher that offers a large range of materials etching possibility such as insulators (SiO2, Si3N4 and SiC), silicon, metals (Al Alloys, Pt, Ti) and some polymers. It is dedicated for etching metals (processes under chlorine chemistry), quartz (fluorine/carbonate chemistry) and polyimide (oxygen chemistry). STS offers a range of different platform options, each compatible with all STS process technologies. The Multiplex has a single process chamber with manually loaded vacuum loadlock and carousel wafer handler for 2-4 wafers.Documents
No documents