Description
200mm ConversionConfiguration
No ConfigurationOEM Model Description
SPTS ICP process module is highly flexible and etches a wide range of materials including oxides, nitrides, polymers, low aspect ratio Si and metals. The Omega ICP process module uses a patented high density plasma source incorporating a radial coil design. The The ICP module is the industry leader for compound semiconductor applications. Typical materials: GaAs GaN SixNy BCB and PolyimideDocuments
No documents
Verified
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131554
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA / SPTS
OMEGA ICP
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131554
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
200mm ConversionConfiguration
No ConfigurationOEM Model Description
SPTS ICP process module is highly flexible and etches a wide range of materials including oxides, nitrides, polymers, low aspect ratio Si and metals. The Omega ICP process module uses a patented high density plasma source incorporating a radial coil design. The The ICP module is the industry leader for compound semiconductor applications. Typical materials: GaAs GaN SixNy BCB and PolyimideDocuments
No documents