OMEGA ICP
Category
Dry / Plasma EtchOverview
SPTS ICP process module is highly flexible and etches a wide range of materials including oxides, nitrides, polymers, low aspect ratio Si and metals. The Omega ICP process module uses a patented high density plasma source incorporating a radial coil design. The The ICP module is the industry leader for compound semiconductor applications. Typical materials: GaAs GaN SixNy BCB and Polyimide
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