SHIBAURA

CDE 80

Main body. 
SMIF Loader
Controller 
CRT
Keyboard Through the wall
SUS Front panel
Al Side panel: Ni Coated 
Pump interface


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Dry Etcher

Parts included:-
-Main body.
-SMIF Loader
-Controller
-CRT
-Keyboard
-Through the wall config.
-SUS Front panel
-Al Side panel: Ni Coated
-Pump interface
Gas system:
(5) MFC Tylan FC-2900 CF4, C12, N2, 02, NF3
Quartz tube protection
C mictube
ESC Universal chuck,
8" Water auxiliaries


This isotropic etching system applicable to wafers of diameter 75 mm to 300 mm has been favoured by customers for many years. While having many achievements for round etching including Si and SiO2, recently this system has also been used for the improvement of device properties by using its remote plasma feature. Its plasma damage-free technology contributes to the designing of high-quality devices.
Features
・Isotropic etching
By generating plasma outside of the chamber and performing the etching processing with radical compounds only, this system is capable of perfect isotropic etching processing.
This system is applied for round processing for trench pattern opening sections.
・Plasma damage-free feature
Due to the long distance from a plasma to a wafer, the ion generated within the plasma is deactivated and does not impact the wafer. This feature is applied to removal of damaged layers after RIE processing.

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CDE 80

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