
Description
Cobra 300 ICP+PECVDConfiguration
Cl₂ (Chlorine) N₂ (Nitrogen) CHF₃ (Trifluoromethane) N₂O (Nitrous Oxide) NH₃ (Ammonia) CF₄ (Carbon Tetrafluoride) SF₆ (Sulfur Hexafluoride) BCl₃ (Boron Trichloride) SiCl₄ (Silicon Tetrachloride) SiH₄/N₂ (Silane in Nitrogen, 5% mixture) Ar (Argon) H₂ (Hydrogen)OEM Model Description
None ProvidedDocuments
No documents
Verified
CATEGORY
Dry / Plasma Etch
Last Verified: 17 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
137003
Wafer Sizes:
Unknown
Vintage:
2021
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
OXFORD
PLASMAPRO 100 COBRA
CATEGORY
Dry / Plasma Etch
Last Verified: 17 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
137003
Wafer Sizes:
Unknown
Vintage:
2021
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Cobra 300 ICP+PECVDConfiguration
Cl₂ (Chlorine) N₂ (Nitrogen) CHF₃ (Trifluoromethane) N₂O (Nitrous Oxide) NH₃ (Ammonia) CF₄ (Carbon Tetrafluoride) SF₆ (Sulfur Hexafluoride) BCl₃ (Boron Trichloride) SiCl₄ (Silicon Tetrachloride) SiH₄/N₂ (Silane in Nitrogen, 5% mixture) Ar (Argon) H₂ (Hydrogen)OEM Model Description
None ProvidedDocuments
No documents