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OXFORD 100 180 ICP
    Description
    No description
    Configuration
    200mm max size (etch area is 100mm via quartz clamp) Physical etch assist via Ar Chemical etch via F or Cl Modification of etching environment toward reducing (H2) or oxidizing (O2) Cryo stage for deep RIE etching (Bosch)
    OEM Model Description
    Etching System
    Documents

    No documents

    OXFORD

    100 180 ICP

    verified-listing-icon

    Verified

    CATEGORY
    Dry / Plasma Etch

    Last Verified: 13 days ago

    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    138636

    Wafer Sizes:

    Unknown

    Vintage:

    2012

    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    OXFORD 100 180 ICP

    OXFORD

    100 180 ICP

    Dry / Plasma Etch
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago
    OXFORD 100 180 ICP

    OXFORD

    100 180 ICP

    Dry / Plasma Etch
    Vintage: 2012Condition: Used
    Last Verified13 days ago
    OXFORD 100 180 ICP

    OXFORD

    100 180 ICP

    Dry / Plasma Etch
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    OXFORD

    100 180 ICP

    verified-listing-icon
    Verified
    CATEGORY
    Dry / Plasma Etch
    Last Verified: 13 days ago
    listing-photo-4946ae8d4c884e1a9767f5b41db88831-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    138636

    Wafer Sizes:

    Unknown

    Vintage:

    2012

    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    200mm max size (etch area is 100mm via quartz clamp) Physical etch assist via Ar Chemical etch via F or Cl Modification of etching environment toward reducing (H2) or oxidizing (O2) Cryo stage for deep RIE etching (Bosch)
    OEM Model Description
    Etching System
    Documents

    No documents

    Similar Listings
    View All
    OXFORD 100 180 ICP

    OXFORD

    100 180 ICP

    Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days ago
    OXFORD 100 180 ICP

    OXFORD

    100 180 ICP

    Dry / Plasma EtchVintage: 2012Condition: UsedLast Verified:13 days ago
    OXFORD 100 180 ICP

    OXFORD

    100 180 ICP

    Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days ago