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Description
Neither matching unit is in working condition The backing pump has failed There is an internal leak in the system, which is believed to be related to the slit valveConfiguration
ICP/RIE Configured to run SF6, Hydrogen and Methane (ITO etch) Frequency: 50/60 hz Voltage: 208 VAC 3 Phase Full Load AMP: 40 AMP'sOEM Model Description
Etching SystemDocuments
No documents
Verified
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Idle
Product ID:
109932
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
OXFORD
100 180 ICP
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Installed / Idle
Product ID:
109932
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Neither matching unit is in working condition The backing pump has failed There is an internal leak in the system, which is believed to be related to the slit valveConfiguration
ICP/RIE Configured to run SF6, Hydrogen and Methane (ITO etch) Frequency: 50/60 hz Voltage: 208 VAC 3 Phase Full Load AMP: 40 AMP'sOEM Model Description
Etching SystemDocuments
No documents