
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
paradigmE XP series products have excellent etch selectivity and low plasma damage for on-wafer devices, and are widely used for film etching in semiconductor front-end and back-end manufacturing.Documents
No documents
Verified
CATEGORY
Dry / Plasma Etch
Last Verified: 21 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
146120
Wafer Sizes:
12"/300mm
Vintage:
2014
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
MATTSON
paradigmE XP
CATEGORY
Dry / Plasma Etch
Last Verified: 21 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
146120
Wafer Sizes:
12"/300mm
Vintage:
2014
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
paradigmE XP series products have excellent etch selectivity and low plasma damage for on-wafer devices, and are widely used for film etching in semiconductor front-end and back-end manufacturing.Documents
No documents